Silicon Sputtering Target Pure Metal Sputtering Target,Manufacturer Metal Sputtering Target, Low price Manufacturer Metal Sputtering Target
4N, 5N, 6N
We supply planar rotary silicon sputtering targets, P type and N type are all available, the purity can up to 6N, the biggest size is 11”. We also supply sprayed rotary silicon sputtering targets, the length can up to 4000mm.
type: poly-crystalline or mono-crystalline
Growth method: Czochralski (CZ)
conductivity type: P type (Boron doped) & N type (phosphorus doped)
specific resistance:0.005-0.02 ohm.cm
10 ohm.cm min
Planeness (TIR): < 1.2μm
Partial planeness (STIR):
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Company: Changsha Xinkang Advanced Materials Co,L
Contact: Ms. Vivian Shan
Location: No.16 xinan road, xingsha county changsha city Hunan, China